Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements
TL;DR
This study uses electrical capacitance sensors and an artificial neural network to monitor residue buildup in semiconductor exhaust pipelines, improving safety and operational efficiency.
Industrial Monitoring of Residue Deposition in Semiconductor Process Exhaust Pipelines Using Electrical Capacitance Measurements
Minho Jeon; Anil Kumar Khambampati; Jong Hyun Song; Keun Joong Yoon; Kyung Youn Kim
https://doi.org/10.1109/ACCESS.2024.3523596
Volume 13
In semiconductor manufacturing, the accumulation of byproducts in exhaust pipelines under inadequate temperature control poses significant safety and operational risks. This study introduces an innovative approach employing an electrical capacitance measurement sensor system combined with an artificial neural network (ANN) to monitor residue buildup. The proposed method estimates the free volume i...